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Derniers dépôts
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Chiara Rossi, Jonas Müller, Peter Pichler, Paweł Piotr Michałowski, Guilhem Larrieu. TCAD modeling and simulation of self-limiting oxide growth and boron segregation during vertical silicon nanowire processing. Materials Science in Semiconductor Processing, 2024, 174, pp.108217. ⟨10.1016/j.mssp.2024.108217⟩. ⟨hal-04639888⟩
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Luca Bettamin, Fabrice Mathieu, Florent H Marty, Marie Charline Blatche, Daniel Gonzalez‐dunia, et al.. Real‐Time and High‐Resolution Monitoring of Neuronal Electrical Activity and pH Variations Based on the Co‐Integration of Nanoelectrodes and Chem‐FinFETs. Small, 2024, 20 (27), pp.2309055. ⟨10.1002/smll.202309055⟩. ⟨hal-04639879⟩
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Peter R Wiecha, Nicholas J. Dinsdale, Otto L. Muskens. Deep Learning Driven Data Processing, Modeling, and Inverse Design for Nanophotonics. Peng Yu; Hongxing Xu; Zhiming Wang. Integrated Nanophotonics: Platforms, Devices, and Applications, Wiley, pp.245-275, 2023, 9783527349128. ⟨10.1002/9783527833030.ch7⟩. ⟨hal-04628291⟩
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Mohamed Ali Khaled, Leonardo Cancellara, Salima Fekraoui, Richard Daubriac, François Bertran, et al.. Large-Scale Epitaxial Integration of Single-Crystalline BiSb Topological Insulator on GaAs (111)A. ACS Applied Electronic Materials, 2024, 6 (5), pp.3771-3779. ⟨10.1021/acsaelm.4c00400⟩. ⟨hal-04584442⟩
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Stéphane Calvez, David Bourrier, Justine Bonneau, Ludovic Salvagnac, Pascal Dubreuil, et al.. Shadow-mask evaporation for the fabrication of optical filters with spatially tailored thickness. Photonics West 2024 -- Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, Jan 2024, San Francisco (CA, USA), United States. pp.128980J-3, ⟨10.1117/12.3000178⟩. ⟨hal-04515494⟩